JPH069015Y2 - 蒸着用電子銃 - Google Patents
蒸着用電子銃Info
- Publication number
- JPH069015Y2 JPH069015Y2 JP5890889U JP5890889U JPH069015Y2 JP H069015 Y2 JPH069015 Y2 JP H069015Y2 JP 5890889 U JP5890889 U JP 5890889U JP 5890889 U JP5890889 U JP 5890889U JP H069015 Y2 JPH069015 Y2 JP H069015Y2
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- electron gun
- crucible
- heating
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007740 vapor deposition Methods 0.000 title claims description 27
- 238000010438 heat treatment Methods 0.000 claims description 20
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 239000002994 raw material Substances 0.000 claims description 7
- 238000007872 degassing Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000001816 cooling Methods 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5890889U JPH069015Y2 (ja) | 1989-05-22 | 1989-05-22 | 蒸着用電子銃 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5890889U JPH069015Y2 (ja) | 1989-05-22 | 1989-05-22 | 蒸着用電子銃 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02149757U JPH02149757U (en]) | 1990-12-21 |
| JPH069015Y2 true JPH069015Y2 (ja) | 1994-03-09 |
Family
ID=31584942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5890889U Expired - Lifetime JPH069015Y2 (ja) | 1989-05-22 | 1989-05-22 | 蒸着用電子銃 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH069015Y2 (en]) |
-
1989
- 1989-05-22 JP JP5890889U patent/JPH069015Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02149757U (en]) | 1990-12-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |